Product Types
FEI's complete line of electron microscopy systems, including TEM, SEM, DualBeam™, and FIB, are designed, engineered and manufactured to address a wide range of applications. Different types of electron microscopes provide distinct capabilities for end-users. FEI electron microscope system types include the following:
Scanning Electron Microscopes (SEM) are used for inspecting topographies of materials with a magnification range that encompasses that of optical microscopy and extends it to the nanoscale. They also provide chemical composition analysis.
Transmission Electron Microscopes (TEM) use high-voltage electron beams to acquire ultra-high resolution sample images down to sub-Ångström levels for analyzing the atomic structure, crystallographic structure and composition of specimens.
DualBeam™ systems, scanning electron microscope and focused ion beam capabilities combined, are the preferred solution for 3D microscopy and analysis serving material characterization, industrial failure analysis and process control applications. They are designed to deliver integrated sample preparation and microanalysis below 1 nm for high-throughput semiconductor and data storage fabs and materials science and life science labs.
FIB systems utilize a finely focused beam of gallium ions operated at low-beam currents for imaging and at high-beam currents for site-specific milling. Their versatility make them popular for a wide variety of applications, including advanced circuit edit and revealing below-the-surface defects in advanced materials and devices.
FEI's specialty tools are designed and engineered to meet your specific needs. From reliable preparation of cryogenic samples for pharmaceutical research to preparing TEM samples from a 300 mm wafer in a semiconductor lab, these tools will enable you to perform your work more quickly, precisely, and easily.